NLO properties of functionalized DNA thin films

TitreNLO properties of functionalized DNA thin films
Type de publicationArticle de revue
AuteurKrupka, Oksana, El-Ghayoury, Abdelkrim , Rau, Ileana, Sahraoui, Bouchta , Grote, James-G., Kajzar, François
EditeurElsevier
TypeArticle scientifique dans une revue à comité de lecture
Année2008
LangueAnglais
Date2008/10/31
Numéro24
Pagination8932 - 8936
Volume516
Titre de la revueThin Solid Films
ISSN0040-6090
Mots-clésDeoyribonucleic acid, DNA, DNA–surfactant complex, Functionalized DNA, Intercalation, NLO properties, Third harmonic generation
Résumé en anglais

In this paper we investigate the third-order nonlinear optical properties of spin deposited thin films of DNA-based complexes using the optical third harmonic generation (THG) technique at a fundamental wavelength of 1064 nm. We found that the third-order susceptibility, χ(3)(− 3ω;ω,ω,ω), of DNA-based films was about one order of magnitude larger than that of our reference, a pure silica slab. In thin films doped with 5% of the chromophore disperse red 1 (DR1), a two order of magnitude larger value of χ(3)(− 3ω;ω,ω,ω) was observed.

URL de la noticehttp://okina.univ-angers.fr/publications/ua2029
DOI10.1016/j.tsf.2007.11.089
Lien vers le document

http://dx.doi.org/10.1016/j.tsf.2007.11.089